首页> 外文会议>MRS fall meeting >Chemical Data Writing into Metal/oxide Interface: Characterization of Low Dimensional Interface Reactions by I-V Measurements
【24h】

Chemical Data Writing into Metal/oxide Interface: Characterization of Low Dimensional Interface Reactions by I-V Measurements

机译:化学数据写入金属/氧化物界面:通过I-V测量表征低维界面反应

获取原文

摘要

We investigated electric and chemical properties of metal/yttria interfaces (M/Y_2O_3, M = Pt or Au). The Pt/Y_2O_3 interface can be chemically activated by bias voltage, yielding a microscopic reactive center at the interface. The oxidation-reduction of the center alternatively changed resistivity of Pt/Y_2O_3, and the alteration provided hysteresis with respect to the bias voltage, i.e. a memory-effect. On the other hand, for Au/Y_2O_3, since non-oxidization of Au ejects of O_2 gas from the interface, no memory-effect can be found. Possible reaction processes of these M/Y_2O_3 systems were proposed, and the balance between oxidation and reduction at the microscopic reactive center was concluded to be essential for the memory-effect.
机译:我们研究了金属/氧化钇界面(M / Y_2O_3,M = Pt或Au)的电和化学性质。 Pt / Y_2O_3界面可以通过偏置电压进行化学激活,从而在界面处产生微观的反应中心。中心的氧化还原交替地改变了Pt / Y_2O_3的电阻率,并且该改变提供了相对于偏压的磁滞,即存储效应。另一方面,对于Au / Y_2O_3,由于Au的非氧化性从界面喷射了O_2气体,因此没有记忆效应。提出了这些M / Y_2O_3体系可能的反应过程,并得出微观反应中心氧化与还原之间的平衡对记忆效应至关重要。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号