首页> 外文会议>Symposium on Nanophase and Nanocomposite Materials >Chemical Data Writing into Metal/oxide Interface: Characterization of Low Dimensional Interface Reactions by I-V Measurements
【24h】

Chemical Data Writing into Metal/oxide Interface: Characterization of Low Dimensional Interface Reactions by I-V Measurements

机译:金属/氧化物接口的化学数据写入:I-V测量的低尺寸界面反应的表征

获取原文

摘要

We investigated electric and chemical properties of metal/yttria interfaces (M/Y_2O_3, M = Pt or Au). The Pt/Y_2O_3 interface can be chemically activated by bias voltage, yielding a microscopic reactive center at the interface. The oxidation-reduction of the center alternatively changed resistivity of Pt/Y_2O_3, and the alteration provided hysteresis with respect to the bias voltage, i.e. a memory-effect. On the other hand, for Au/Y_2O_3, since non-oxidization of Au ejects of O_2 gas from the interface, no memory-effect can be found. Possible reaction processes of these M/Y_2O_3 systems were proposed, and the balance between oxidation and reduction at the microscopic reactive center was concluded to be essential for the memory-effect.
机译:我们调查了金属/ ytTria界面的电气和化学性质(M / Y_2O_3,M = PT或Au)。 Pt / Y_2O_3接口可以通过偏压进行化学激活,在界面处产生微观反应中心。中心的氧化还原还原改变了Pt / Y_2O_3的电阻率,并且改变为偏压而提供滞后,即存储器效果。另一方面,对于Au / Y_2O_3,由于来自界面的O_2气体的非氧化,可以找到内存效果。提出了这些M / Y_2O_3系统的可能反应过程,结论是对记忆效应至关重要的氧化与微观反应中心的氧化和减少之间的平衡。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号