首页> 外文会议>Proceedings of ISES Solar World Congress 2007: Solar Energy and Human Settlement >CO-EXISTENCE OF F AND Sb DOPANTS IN TRANSPARENT CONDUCTING SnO2 THIN FILMS PREPARED BY ULTRASONIC SPRAY PYROLYSIS METHOD
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CO-EXISTENCE OF F AND Sb DOPANTS IN TRANSPARENT CONDUCTING SnO2 THIN FILMS PREPARED BY ULTRASONIC SPRAY PYROLYSIS METHOD

机译:超声喷雾热解法制备的透明导电SnO2薄膜中F和Sb掺杂的共存

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Thin films of undoped, fluorine(F)- doped, antimony (Sb)-doped, fluorine and antimony co-doped SnO2 thin films were prepared by ultrasonic spray pyrolysis technique using SnCl2, NH4F and SbCl3 as precursors of Sn, F and Sb elements respectively. In F and Sb co-doped SnO2 films, the proportions of F and Sb to Sn in starting solution were found to be 15 and 2 wt%. XRD patterns showed that the preferred orientation of undoped, SnO2:F, SnO2:Sb and SnO2:F,Sb was dependent on the doping concentration and on annealing atmosphere. The variation of doping concentration and preferred orientation of the films was reflected in their morphology as investigated by SEM. The annealed SnO2:F, Sb films showed the lower transmission value than the value obtained in the as-prepared SnO2:F, Sb films. Photoluminescence spectra of the undoped SnO2 films showed a broad emission band peaking around 400, 430, and 520 nm. This emission band may be attributed to oxygen vacancy and surface defects.
机译:通过使用SNCL2,NH4F和SBCL3作为SN,F和SB元素的前体,通过超声波喷雾热解技术制备未掺杂的氟(F)掺杂的,锑(SB) - 掺杂的锑(Sb),致锑(Sb),氟和锑共掺杂的SnO 2薄膜分别。在F和Sb共掺杂的SnO 2膜中,发现F和Sb在起始溶液中的比例为15和2wt%。 XRD图案表明,未掺杂,SnO2:F,SnO2:Sb和SnO2:F,Sb的优选取向取决于掺杂浓度和退火气氛。掺杂浓度和膜优选取向的变化反映在其形态中,如SEM所研究的。退火的SnO2:F,Sb膜显示出比在制备的SnO2:F,Sb膜中获得的值较低的透射值。未掺杂的SnO2膜的光致发光光谱显示出宽度为400,430和520nm的宽度发射带。该发射带可以归因于氧气空位和表面缺陷。

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