Enhancing the diffraction efficiency for direct laser writing of continuous-relief diffractive optical elements (DOEs) is discussed. An influence of laser beam positioning errors on the diffraction efficiency has been investigated. Optimization of exposure data set permits to decrease negative effects related to positioning errors and with convolution of a desired phase profile with writing beam intensity distribution. New methods (zone boundary optimization and optimized double writing) with exposure optimization near diffractive zone boundaries have been proposed and compared with known ones.
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