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Plasma Charging and Damage Evaluation of Reactive Ion Etching using Surface Photovoltage Technique and Corona Pulsed Deep Depletion Technique

机译：表面光电压技术和电晕脉冲深度耗尽技术对反应离子刻蚀的等离子体充电和损伤评估

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《Next Generation Internet Networks, 2005》|2005年|p.87-90|共4页
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Nagalingami S.; Min-Su Fung; Thind S.;
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中图分类自动化技术、计算机技术;
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1. Depth profiling of surface damage in n-type GaN induced by inductively coupled plasma reactive ion etching using photo-electrochemical techniques [J] . Yamada Shinji, Takeda Kentaro, Toguchi Masachika, Annales de l'I.H.P . 2020,第10期

机译：采用光电化学技术，电感耦合等离子体反应离子蚀刻诱导的N型GaN的表面损伤深度分析
2. Improvement of interfacial adhesion and jnondestructive damage evaluation for plasma-treated PBO and Kevlar fibers/epoxy composites using micromechanical techniques adn surface wettability [J] . Joung-Man Park, Dea-Sik Kim, Sung-Ryong Kim Journal of Colloid and Interface Science . 2003,第2期

机译：使用微机械技术和表面润湿性改善等离子处理的PBO和Kevlar纤维/环氧树脂复合材料的界面粘附力和非破坏性损伤评估
3. Improvement of interfacial adhesion and nondestructive damage evaluation for plasma-treated PBO and Kevlar fibers/epoxy composites using micromechanical techniques and surface wettability [J] . Park JM., Kim DS., Kim SR. Journal of Colloid and Interface Science . 2003,第2期

机译：使用微机械技术和表面润湿性改善等离子处理的PBO和Kevlar纤维/环氧树脂复合材料的界面粘合性和无损破坏评估
4. Plasma Charging and Damage Evaluation of Reactive Ion Etching using Surface Photovoltage Technique and Corona Pulsed Deep Depletion Technique [C] . Nagalingami, S., Min-Su Fung . 2001

机译：表面光电压技术和电晕脉冲深度耗尽技术对反应离子刻蚀的等离子体充电和损伤评估
5. CHARACTERIZATION OF INDIUM-PHOSPHIDE AND GALLIUM-ARSENIDE BY THE SURFACE PHOTOVOLTAGE TECHNIQUE (SEMICONDUCTORS, RADIATION DAMAGE, DIFFUSION LENGTH). [D] . CHIANG, CHING-LANG. 1984

机译：通过表面光电压技术（半导体，辐射损伤，扩散长度）表征磷化铟和砷化镓。
6. Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applications [O] . Ho-Kun Sung, Tian Qiang, Zhao Yao, -1

机译：垂直和斜面结构的SiC蚀刻技术结合了用于各种微电子应用的不同混合气体等离子体
7. Surface Characterization of the Corona-Treated Cellulose Fibre Sheet by Chemical Modification-ESCA Technique (Part 1). Analysis of the Functional Groups Formed on the Corona-Treated Cellulose Fibre Sheet Surface by Means of Chemical Modification in Liquid Phase-ESCA Technique. [O] . Atsushi Sawatari, Hiroshi Nakamura 1993

机译：通过化学改性-ECASA技术（第1部分）的电晕处理的纤维素纤维片的表面表征。通过液相 - ESCA技术的化学改性分析在电晕处理的纤维素纤维片表面上形成的官能团。
8. Surface Damage on GaAs Induced by Reactive Ion Etching and Sputter Etching [R] . Pang, S. W. 1986

机译：反应离子刻蚀和溅射刻蚀诱导Gaas表面损伤

Plasma Charging and Damage Evaluation of Reactive Ion Etching using Surface Photovoltage Technique and Corona Pulsed Deep Depletion Technique

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