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Investigation of RF Performance of Nano-Scale Ultra-Thin-Body Schottky-Barrier MOSFETs Using Monte Carlo Simulation

机译:蒙特卡罗模拟研究纳米级超薄肖特基势垒MOSFET的射频性能

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摘要

A Monte Carlo investigation of the dynamic performance of nano-scale ultra-thin-body (UTB) Schottky-Barrier MOSFETs (SB-MOSFETs) is presented. A thorough account of how the gate voltage and SB barrier height affect the RF performance of UTB SB-MOSFETs is elaborated. The UTB SB-MOSFET offers excellent RF performance with high values of fTand fmax. The peak fTis higher than 600 GHz with SB height ranging from 0.2eV to 0.3eV. It is found that gate voltage has a significant influence on fTand fmaxof UTB SB-MOSFETs whereas the barrier height is of minor importance. However, both gate voltage and SB height affect the gmand gdsobviously. For high performance of UTB SB-MOSFETs, appropriate gate voltage and SB height is of great importance.
机译:提出了蒙特卡洛研究的纳米级超薄(UTB)肖特基势垒MOSFET(SB-MOSFET)的动态性能。详细阐述了栅极电压和SB势垒高度如何影响UTB SB-MOSFET的RF性能。 UTB SB-MOSFET具有出色的RF性能,具有很高的f T 和f max 值。 f T 峰值高于600 GHz,SB高度在0.2eV至0.3eV之间。发现栅极电压对UTB SB-MOSFET的f T 和f max 有显着影响,而势垒高度次要。但是,栅极电压和SB高度都明显影响g m 和g ds 。为了实现UTB SB-MOSFET的高性能,适当的栅极电压和SB高度至关重要。

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