0.1/spl mu/m poly-Si thin film transistors for system-on-panel (SoP) applications

摘要

Thin active layer, fully-silicided source/drain (S/D), modified Schottky barrier, high dielectric constant (high-k) gate dielectric, and metal gate technologies are integrated to realize high performance TFTs. Devices with 0.1 mum channel length were fabricated successfully. Low threshold voltage, low subthreshold swing, high effective mobility, low S/D resistance, high on/off current ratio, and good control of threshold voltage are demonstrated