首页> 外文会议>Transparent Optical Networks, 2004. Proceedings of 2004 6th International Conference on >Photonic crystal waveguide - fabrication of the periodic arrays by visible light holographic technique coupled with electron beam-induced deposition
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Photonic crystal waveguide - fabrication of the periodic arrays by visible light holographic technique coupled with electron beam-induced deposition

机译:光子晶体波导-通过可见光全息技术结合电子束诱导沉积来制造周期阵列

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In recent years a lot of interest has been directed towards waveguide-based two dimensional photonic crystals. The reason behind this interest is a possibility of employing them in future photonic integrated circuits (PIC). With the photonic-crystal-based PIC it will be possible, for the first time, to realize compact in size, multicomponent optical integrated circuits. In this article we present a simple fabrication method for large arrays of holes of arbitrary shape and size. Later, a method of local modification of the structure (defect creation) is also given. Fabrication of the periodic array in photoresist is made through the multiple exposition of thin photoresist film with two interfering laser beams (holographic method). Exposition has been done with a pulsed Nd-YAG laser. The setup has been adapted from the existing one, previously used to fabricate diffraction gratings in positive photoresist films (the gratings served as grating couplers for planar waveguides). An idea of periodic pattern fabrication with the setup similar to ours was first proposed in 1975, but no further consideration for any application was given then. In this paper we present two examples of periodic structures obtained with double expose, with substrates rotated by the angles of 75/spl deg/ and 90/spl deg/. The one dimensional period of the structures was equal to 1.26 /spl mu/m. Two different shapes of holes were obtained in photoresist. In the second exposition setup (90/spl deg/) nearly circular openings with diameter of 780 nm were achieved. The commonly known problem with fabrication of photonic crystals by the holographic method is difficulty in defect creation. Here, we propose the use of three-dimensional additive nanolithography with electron beam-induced deposition (EBID) for this task. Both a point defect (local resonator) and a line defect (channel waveguide) have been fabricated and documented.
机译:近年来,人们对基于波导的二维光子晶体有了很多兴趣。这种兴趣背后的原因是有可能在未来的光子集成电路(PIC)中使用它们。有了基于光子晶体的PIC,将有可能首次实现尺寸紧凑的多组件光学集成电路。在本文中,我们提出了一种用于任意形状和大小的大型孔阵列的简单制造方法。后来,还给出了一种局部修改结构(缺陷创建)的方法。光致抗蚀剂中的周期性阵列的制造是通过将光致抗蚀剂薄膜与两个干涉激光束多次曝光(全息方法)来进行的。用脉冲Nd-YAG激光进行了曝光。该装置是从现有装置中改编而成的,该装置以前用于制造正性光致抗蚀剂膜中的衍射光栅(这些光栅用作平面波导的光栅耦合器)。 1975年首次提出了一种具有与我们相似的设置的周期性图案制造的想法,但是随后没有对任何应用进行进一步的考虑。在本文中,我们介绍了通过双重曝光获得的周期性结构的两个示例,其中基板旋转了75 / spl deg /和90 / spl deg /的角度。结构的一维周期等于1.26 / spl mu / m。在光致抗蚀剂中获得了两种不同形状的孔。在第二次曝光设置中(90 / spl deg /),获得了直径为780 nm的几乎圆形的开口。通过全息方法制造光子晶体的普遍已知的问题是难以产生缺陷。在这里,我们建议将三维附加纳米光刻技术与电子束诱导沉积(EBID)结合使用。点缺陷(局部谐振器)和线缺陷(通道波导)均已制作和记录。

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