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REMOVAL OF NANO-SCALE PARTICLES FROM FLAT AND STRUCTURED SURFACES

机译:从平面和结构化表面去除纳米级颗粒

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摘要

High frequency acoustic streaming is a promising technique for nano-scale particle removal from both flat and structured surfaces. Using DI water, the removal of nano-size particles down to 10 nm from flat surface was shown at a frequency above 1.3 MHz. As the frequency increases, the acoustic boundary layer thickness decreases and the streaming velocity increases thereby increasing the drag force and consequently the removal moment. By utilizing the electrical double layer force as a repulsive force (by using basic chemistry,) the removal of 10nm silica particles from flat surfaces can be accomplished using megasonic cleaning above 800 kHz. Oscillating flow induced vortex oscillation is essential to remove particles from structured surfaces. In the absence of particle deformation, 50nm PSL particle can be removed from a structured silica surface (a 1mm~* 1mm trench) using high intensity (25 W/cm~2) and high frequency (850 kHz) acoustic streaming.
机译:高频声流是一种有希望的纳米级颗粒从平坦和结构化表面去除的技术。使用二水,以高于1.3MHz的频率示出了从平坦表面去除到10nm的纳米尺寸颗粒。随着频率的增加,声边界层厚度减小,流速增加,从而增加拖动力并因此增加了去除力矩。通过利用作为排斥力的电双层力(通过使用基本化学),可以使用高于800kHz的兆声清洁来完成从平坦表面的10nm二氧化硅颗粒。摆动流动诱导的涡旋振荡对于从结构化表面中除去颗粒是必不可少的。在没有颗粒变形的情况下,可以使用高强度(25W / cm〜2)和高频(850kHz)声学流来从结构化的二氧化硅表面(1mm〜* 1mm沟槽)中除去50nM的PSL颗粒。

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