Plasma Source Ion Implantation (PSII) is a non-line-of-sight technique for energetic ion surface modification of materials. At the University of Wisconsin there are presently three PSH systems two of which measure about 1m~3 and a third that measures 0.1m~3. Plasma generation is achieved in vacuum through filamentary, RF, DC-pulsed, or glow discharge. High voltage pulsing is achieved using a tetrode modulator that pulses at up to 60kV or by a solid-state pulser that can supply 20kV. Recently, a crossatron modulator capable of 40kV and 1kA peak anode current was built in-house. Surface properties of a wide range of materials have been beneficially modified using PSH in ion implantation, film deposition, energetic ion mixing, and sputtering modes. Industrial field testing of PSII-treated parts has yielded promising results but successful commercialization requires judicious selection of applications which effectively exploit the unique aspects of PSH as a surface modification tool.
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