Influence of hydrogen plasma processing on gas sensitivie tin dioxide thin film properties

摘要

The influence of glow discharge hydrogen plasma processing on undoped tin dioxide (SnO_2) thin film structure and properties have been investigated. The films of 150 - 200 nm thickness were deposited by a method of magnetron sputtering on Al_2O_3 substrate at the temperature of this one 250 deg C with a rate of 1.5 - 2.0 nm/min in argon - oxygen mixture atmosphere. It was shown these films are amorphous just after fabrication, theirs polycrystalline structure appears after annealing and disappears after processing in the hydrogen plasma. Such a processing expands a temperature rang eof film sensitivity to ethanol and heptane vapors, increases the sensitivity to low concentration of those.