Comparison of acrylate and methacrylate resin system in ArF ithography

摘要

Using 2MAdMA(2-Metyl-2-Adamantylmethacrylate), 2MAdAA(2-Metyl-2-Admantylacrylate), GBLMA( gamma -butvrolactone methoacrylate), GBLAA( gamma -butyrolactone acrylate) monomers, 4 types of copolymers, 2MAdMA/GBLMA, 2MAdMA/GBLAA, 2MAdAA/GBLMA, 2MAdAA/GBLAA resins were prepared. The same PAG formulation was applied to these resins to amke ArF rsist samples. Resolution capability, dry-etching resistance were evaluated. From the reesult, It can be concluded that 2MAdAA/GBLMA resin system has the best balance in dry etching resistance, resolution and sensitivity.