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Wave polymerizationduring vapor deposition of porous parylene-N dielectric films

机译：气相沉积聚对二甲苯-N介电薄膜时的波聚合

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Parylene-N films vapor deposited near liquid nitrogen temperature (77 K) undego a unique 'wave' polymerization process in which a rapidly moving reaction front is apparent as the film changes from translucent to optically opaque. THis moving reaction front produces a highly porous polymer film. The porosity of these films is approximately 80

机译：在液氮温度（77 K）附近气相沉积的聚对二甲苯-N薄膜经历了独特的“波动”聚合过程，其中，随着薄膜从半透明变为不透光，反应前沿迅速显现。该移动反应前沿产生高度多孔的聚合物膜。这些薄膜的孔隙率约为80

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《Symposium on low-dielectric constant materials 》|1999年|p.23-28|共6页
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James Erjavec; John Sikita; Stephen P.Beaudoin; Gregory B.Raupp;
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中图分类无线电电子学、电信技术 ;
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Wave polymerizationduring vapor deposition of porous parylene-N dielectric films

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