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Growth and Structure of Nanometric Iron Oxide Films

机译:纳米氧化铁膜的生长与结构

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Nanometric films of iron oxides (Fe_3O_4, #alpha# and #gamma# Fe_2O_3) of high crystallien order and purity are epitaxially grown on #alpha#-Al_2O_3(0001) by atomic oxygen assisted MBE. A complete characterization of the film structure has been performed by in situ LEED and RHEED, and ex situ GIXRD using synchrtron radiation. The films grown at room temperautre and post annealed at 400 deg C and 700 deg C (p_o2=10~-6 Torr) are respectively metastable #gamme#-Fe_2O_3 (111) and #alpha#-Fe_2O_3(0001). For a substrate temperature of 450 deg C during growth, Fe_3O_4 (111) is directly obtained. GIXRD shows an in-plane expansion of the films, which decreases with thickenss (0.8 and 0.2
机译:通过原子氧辅助的MBE在#alpha#-Al_2O_3(0001)上外延生长具有高结晶度和纯度的氧化铁(Fe_3O_4,#alpha#和#gamma#Fe_2O_3)的纳米膜。膜结构的完整表征已通过原位LEED和RHEED,以及使用同步辐射的原位GIXRD进行了表征。在室温下生长并在400℃和700℃(p_o2 = 10〜-6 Torr)退火的薄膜分别为亚稳态#gamme#-Fe_2O_3(111)和#alpha#-Fe_2O_3(0001)。对于生长期间的基板温度为450摄氏度,直接获得Fe_3O_4(111)。 GIXRD显示薄膜的面内膨胀,随着厚度的增加而减小(0.8和0.2

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