Performance of MEMS-based gas distribution and control systems for semiconductor processing

摘要

The advent of microelectromechanical systems has enabled dramatic changes in diverse technological areas. In terms of control and distribution of liquids and gases (microfluidics), MEMS-based devices offer opportunities to achieve increased performance, and higher levels of functional integration, at lower cost, with decreased size and increased reliability. This work focuses on recent research and development of high-purity gags distribution and control systems for semiconductor processing. These systems include the following components, based upon both normally-open and normally-closed microvalves: pressure- based mass flow controllers; vacuum leak-rate shut-off valves; and pressure regulators. Advanced packaging techniques enable these components to be integrated into gas sticks and panels which have small size, corrosion-resistant wetted materials, small dead volumes, and minimal particle generation. Principles of operation of components and panels, and performance data at both the component and system level, will be presented. The potential for 10$MUL size reduction (linear dimension), 2$MUL product yield improvement (through increased reliability, improved flow accuracy and repeatability, and contamination reduction), and 5$MUL reduction in process gas consumption, will also be addressed. Particular emphasis on characterization and verification of flow measurements in mass flow controllers (versus NIST standards), and the flow models used in designing and characterizing these systems, will be made.