ORGANIC CONTAMINATION ANALYSIS IN SEMICONDUCTOR SILICON TECHNOLOGY. DETRIMENTAL, CLEANLINESS' IN CLEANROOMS

摘要

Today, the knowledge about the detrimental impact of organics in semiconductor technology is established. We report on investigations into cleanroom air, wafer haze and outgassing from polymeric workpieces by HS-GC/MS (headspace gas chromatography / mass spectrometry), TD-GC/MS (thermodesorption-GC/MS) and IMS/MS (ion mobility spec-trometry/MS). The discussion of the various metrology methods, that are available today for organic surface analysis, and of the corresponding methods of sample taking clearly demonstrates the need for classification and standardization in the field of organic contamination analysis in clean-rooms.