New fabrication method for diffractive optical elements with deep phase relief

摘要

Abstract: The application of continuous-tone photomasks for fabrication of diffractive optical elements with a deep phase relief is explored. Results of computer simulation for technological process are reported and compared with experiment. The experimental testing of offered technique was carried out on thick AZ4562 photoresist layers. The possibility of deep phase relief fabrication has been proven. The application of the new technique to fabrication of multiorder diffractive elements is discussed. !20