Surface characteristics, etching behaviors and chemical-mechanical polishing of aluminum alloy thin films

摘要

Etching behaviours of various Al alloys thin films in H_2O_2-based acidic etchants are investigated in this study. The pH and H_2O_2 content in the etchant are varied in order to simulate the cae where Al thin films are subject to chemical-mechanical polishing (CMP) using slurries of different compositions. Corrosion current and thickness of the native oxide on pure-Al, Al-1