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Physical and optical properties of sputtered lithium niobate thin films

机译:溅射铌酸锂薄膜的物理和光学性质

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Abstract: LiNbO$-3$/ thin films were deposited by rf magnetron sputtering using LiNbO$-3$/ ceramic targets on z-cut single crystal LiTaO$-3$/ substrate. The as-deposited thin films were annealed at 550 degrees Celsius to 650 degrees Celsius for 60 min in oxygen ambient. The results of x-ray diffraction indicate that the dominant orientation of the sputtered LiNbO$-3$/ thin film is (202). The transmittance spectra of LiNbO$-3$/ thin films annealed at different temperatures were measured and compared with that of bulk single crystal substrate (the measured wavelength range is from 300 nm to 800 nm). The transmittance drops down to about 10% at 300 nm wavelength and has a value of 70 to approximately 80% at 800 nm wavelength. !16
机译:摘要:用LiNbO $ -3 $ /陶瓷靶通过射频磁控溅射在Z切单晶LiTaO $ -3 $ /衬底上沉积LiNbO $ -3 $ /薄膜。将所沉积的薄膜在氧气环境中于550摄氏度至650摄氏度下退火60分钟。 X射线衍射的结果表明,溅射的LiNbO $ -3 $ /薄膜的主要取向是(202)。测量了在不同温度下退火的LiNbO $ -3 $ /薄膜的透射光谱,并与块状单晶衬底的透射光谱进行了比较(测得的波长范围为300 nm至800 nm)。透射率在300 nm波长下下降至约10%,在800 nm波长下的透射率在70至约80%之间。 !16

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