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High-performance multilayer structures for grazing incidence hard x-ray optics

机译:用于掠入射硬X射线光学器件的高性能多层结构

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Abstract: Grazing incidence hard x-ray multilayer structures require the capability to deposit ultra-thin (of the order of monolayers, i.e. single angstrom), ultra-smooth (of the order of an angstrom rms value), uniform, alternating films of high Z and low Z materials, with sharp interfaces and no interdiffusion between the layers. Vapor phase deposition processes such as evaporation and sputtering can not achieve all the above goals. We have developed a new deposition process which does not involve the use of vacuum, is performed at a low temperature, can be scaled up to large surface areas and to curved substrates, is low cost, and results in ultra thin (monolayers), ultra smooth, uniform, high density films with sharp interfaces. This is optimal for the construction of multilayer x-ray optical components. Multilayer structures of various High Z/ low Z materials were deposited using our new deposition process. The surface characterization and x-ray reflectivity of these multilayer structures are presented. !12
机译:摘要:掠入射硬X射线多层结构需要能够沉积超薄(单层数量级,即单埃),超光滑(安培rms值数量级),均匀,高交替的薄膜Z和低Z材料,具有清晰的界面,层之间没有相互扩散。汽相沉积工艺(例如蒸发和溅射)无法实现所有上述目标。我们开发了一种新的沉积工艺,该工艺不涉及真空的使用,它是在低温下进行的,可以按比例放大到较大的表面积和弯曲的基材,成本低廉,并且可以形成超薄(单层),超薄光滑,均匀,高密度的薄膜,具有清晰的界面。这对于多层x射线光学组件的构造是最佳的。使用我们的新沉积工艺沉积了各种高Z /低Z材料的多层结构。介绍了这些多层结构的表面表征和x射线反射率。 !12

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