Abstract: Low pressure plasma can effectively be used for the fabrication of films for optical waveguides and for the patterning of photonic devices. The present paper describes the basic physical and chemical processes during the plasma deposition of passive waveguides, particularly of silicon compound layers such as silicon oxide, nitride and oxynitrides. We give an overview of the effects of discharge parameters (reactor design, gas composition, energy of bombarding ions, substrate temperature) on the optical properties of the waveguide materials, and their relation to the microstructural and mechanical characteristics. Advances in plasma- fabricated photonic devices on silicon substrates are discussed.!41
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