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Electric field enhancement in metallic and multilayer dielectric gratings

机译:金属和多层介质光栅中的电场增强

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Abstract: Successful operation of large-scale high-power lasers, such as those in use and planned at LLNL and elsewhere, require optical elements that can withstand extremely high fluences without suffering damage. Of particular concern are gratings used for pulse compression. Laser induced damage to bulk dielectric material originates with coupling of the electric field of the radiation to bound electrons, proceeding through a succession of mechanisms that couple the electron kinetic energy to lattice energy and ultimately to macroscopic structural changes (e.g. fracture, melting, ablation, etc.). The constructive interference that is responsible for the diffractive behavior of a grating or the reflective properties of a multilayer dielectric stack can enhance the electric field above values that would occur in unstructured homogeneous material. The presence of nonuniform electric fields, resulting from diffractive coherence, has the potential to affect damage thresholds. We describe aspects of LLNL work directed towards understanding the influence of dielectric structures upon damage, with particular emphasis on electric fields within multilayer dielectric stacks. !3
机译:摘要:大型高功率激光器的成功运行,例如在LLNL和其他地方正在使用和计划中的激光器,要求光学元件能够承受非常高的能量密度而不会受到损害。特别关注的是用于脉冲压缩的光栅。激光对块状介电材料的损害始于辐射电场与束缚电子的耦合,然后通过一系列将电子动能与晶格能耦合并最终与宏观结构变化(例如,断裂,熔化,烧蚀,等等。)。造成光栅的衍射行为或多层介电叠层的反射特性的相长干涉可以使电场增强到高于在非结构化均质材料中会发生的值。由衍射相干引起的不均匀电场的存在有可能影响损伤阈值。我们描述了LLNL工作的各个方面,这些工作旨在了解电介质结构对损伤的影响,尤其着重于多层电介质堆叠内的电场。 !3

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