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Microfocusing optics for hard xrays fabricated by x-ray lithography

机译:用于X射线光刻的硬X射线微聚焦光学器件

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Abstract: Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold. !10
机译:摘要:讨论了用于制造硬X射线菲涅耳波带片的光刻技术。介绍了在威斯康星大学麦迪逊分校的X射线光刻中心获得的实际结果。制造技术包括通过同步辐射X射线光刻将电子束写入的主掩模复制到厚光刻胶中,以及随后使用光刻胶图案作为模具电镀金属区带结构。 !10

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