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Influence of polishing fluid on ultrasmoothness polishing of Al-Mg alloy plate

机译:抛光液对Al-Mg合金板超光滑抛光的影响

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Abstract: In the ultra smoothness polishing of a kind of Al-Mg alloy plate with alumina and colloidal silica abrasives, the influence of the hydrogen exponent of polishing fluids on the removal rate and the smoothness are examined and discussed by polishing in four hydrogen exponent of fluids of pH $EQ 2.3 (acid), pH $EQ 7.3 (neutral), pH $EQ 9.7 (middle alkaline) and pH $EQ 11.7 (strong alkaline). In case of polishing with alumina abrasives, the acid fluid has better influence on the removal rate and the surface smoothness than the neutral and the alkaline fluid. The removal rate and the smoothness for alumina-polishing in the neutral fluid are extremely small and worse than those before polishing. The best micro-area smoothness obtained by alumina-polishing in the acid fluid is about 13 nm (P-V). In case of polishing with colloidal silica abrasives, the alkaline fluid has better influence on the removal rate but the hydrogen exponent of fluid has little influence on the smoothness. The best micro-area smoothness is about 5 nm (P-V) for silica-polishing but that excluding pits of about 5 nm in depth becomes below 2 nm. In the silica-polishing of pure aluminum plate, the pit is not formed on the polished surface.!2
机译:摘要:在氧化铝和胶体二氧化硅磨料对一种Al-Mg合金板的超光滑抛光中,研究了抛光液中氢指数对抛光速率,去除率和光滑度的影响,并通过抛光中的四个氢指数进行了探讨。 pH $ EQ 2.3(酸),pH $ EQ 7.3(中性),pH $ EQ 9.7(中碱性)和pH $ EQ 11.7(强碱性)的液体。在用氧化铝磨料进行抛光的情况下,与中性和碱性流体相比,酸性流体对去除率和表面光滑度的影响更大。与抛光前相比,中性流体中氧化铝抛光的去除率和光滑度极小且较差。通过在酸性流体中进行氧化铝抛光获得的最佳微区平滑度约为13 nm(P-V)。在使用胶体二氧化硅磨料进行抛光的情况下,碱性流体对去除率的影响更大,而流体的氢指数对光滑度的影响则很小。对于二氧化硅抛光,最佳的微区平滑度约为5 nm(P-V),但不包括深度约为5 nm的凹坑,其平滑度将低于2 nm。在纯铝板的二氧化硅抛光中,在抛光表面上不会形成凹坑。!2

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