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Effect of Dielectric Process on the Interfacial Adhesion of RDL for FOWLP

机译:介电工艺对FOWLP RDL界面粘合力的影响

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The effect of low-temperature curable polybenzoxazole (PBO) process conditions on the interfacial adhesion energies between PBO dielectric and Cu redistribution layer for advanced fan-out packaging (FO package) were systematically investigated. The interfacial adhesion energies were 13.8 ± 2.0, 21.7 ± 2.7, and 6.3 ± 0.4 J/m2 under PBO curing temperature at 175, 200, and 225 °C, respectively. The X-ray photoelectron spectroscopy analysis showed that there exists a good correlation between the interfacial adhesion energy and the O 1s peak area fraction. Also, the nanoindentation analysis showed that there exists a little correlation between the interfacial adhesion energy and the hardness. Therefore, the optimized curing temperature of PBO must be carefully controlled to obtain interfacial adhesion of improvement to achieve interfacial reliability for advanced FO package.
机译:系统地研究了低温可固化聚苯并恶唑(PBO)工艺条件对高级扇出包装(FO封装)的PBO介电层和Cu再分布层之间界面粘合能的影响。界面粘合能为13.8±2.0、21.7±2.7和6.3±0.4 J / m 2 在PBO固化温度下分别为175、200和225°C。 X射线光电子能谱分析表明,界面黏附能与O 1s峰面积分数之间存在良好的相关性。另外,纳米压痕分析表明界面粘合能与硬度之间几乎没有相关性。因此,必须仔细控制PBO的最佳固化温度,以获得改进的界面粘合力,以实现高级FO封装的界面可靠性。

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