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Better Thermal, Mechanical and Dielectric Properties of Cured Polyimides Using Low Pressure Vacuum Cure Processing

机译:使用低压真空固化工艺可更好地固化聚酰亚胺的热,机械和介电性能

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In this paper, to meet the demand placed on Polyimide materials in Fan Out Wafer and Panel Level Processing applicable to Heterogeneous Integration, thermal, mechanical, and dielectric properties were studied for different types of Polyimide and Poly-Benz-Oxazole (PBO) materials, such as HD-4100, HD-8820 and HD7110, as a function of different process parameters, under atmospheric and vacuum process conditions. Vacuum cure results in higher thermal stability with lower outgassing in HD-4100 and HD-8820 films. Vacuum cure of HD-4100 and HD-7110 appears to increase the dielectric strength, but no similar trend is seen for HD-8820. These results are consistent with the assumption that cure under vacuum reduces the amount of volatile and volatilizable material remaining in the film after the cure process.
机译:在本文中,为了满足扇出晶片和面板级加工中适用于异质集成的聚酰亚胺材料的需求,研究了不同类型的聚酰亚胺和聚苯并恶唑(PBO)材料的热,机械和介电性能,例如HD-4100,HD-8820和HD7110,在大气和真空工艺条件下,随不同工艺参数的变化而变化。真空固化可提高HD-4100和HD-8820薄膜的热稳定性,并减少脱气。 HD-4100和HD-7110的真空固化似乎可以提高介电强度,但是HD-8820没有类似的趋势。这些结果与以下假设一致:真空固化会减少固化过程后薄膜中残留的挥发性和可挥发物质的数量。

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