首页> 外文会议>Conference on Optical Microlithography >A discussion of the regression of physical parameters for photolithographic process models
【24h】

A discussion of the regression of physical parameters for photolithographic process models

机译:光刻过程模型物理参数回归的探讨

获取原文

摘要

All models currently used for Optical Proximity Correction and related Resolution Enhancement techniques are comprised of an analytical description of the modeled system with coefficients determined by data collected from the physical process. The analytical model is normally based on the Hopkin's approximation of the system because this approximation allows the reticle to be a variable in the exposure system. The analytical component of the model contains terms such as numerical aperture, partial coherence, and wavelength, all of which are physical parameters that can be directly read from the equipment used to generate the empirical process data. Therefore, these physical parameters can be directly used in the process model and do not need to be modified. One case example of a physical parameter is the illuminator shape. In an annular exposure system, the center of the exposure system is blocked to allow illumination by high order illumination components. The annular shape can be achieved in different manners. The scanner manufacturer can use a shape cut in a metal form to achieve an annular illumination condition or the scanner manufacturer can use a lens system to achieve the same illumination condition. Both of these systems have the same inner and outer diameters, resulting in the same annulus and therefore the same illumination technique. However, experimental data show that for the exact same setting values, the annular illumination shape is detectably different. This is a first order system difference that is the result of different implementation methods. Further differences can be found due to scanner to scanner variations in either lens shape or aperture shape. These differences create a need for physical parameters to be regressed during fitting of empirical data to the analytical model. This paper will discuss the need to regress what initially appear to be constant physical parameters during the model fitting process. The study will use equipment variability information to demonstrate the range of physical constant impact upon the accuracy of a process model.
机译:目前用于光学邻近校正的所有模型和相关分辨率增强技术包括由由从物理过程收集的数据确定的系数的模拟系统的分析描述。分析模型通常基于跳跃的系统近似,因为该近似允许掩模版在曝光系统中是一个变量。该模型的分析组件包含诸如数值孔径,部分相干性和波长的术语,所有这些都是可以从用于生成经验过程数据的设备直接读取的物理参数。因此,可以在过程模型中直接使用这些物理参数,不需要修改。物理参数的一个案例示例是发光器形状。在环形曝光系统中,曝光系统的中心被阻挡以允许通过高阶照明组件的照射。环形形状可以以不同的方式实现。扫描仪制造商可以使用金属形式切割形状以实现环形照明条件,或者扫描仪制造商可以使用镜头系统来实现相同的照明条件。这两种系统都具有相同的内径和外径,导致相同的环形,因此相同的照明技术。然而,实验数据表明,对于完全相同的设定值,环形照明形状可检测地不同。这是一个第一订单系统差异,这是不同实现方法的结果。由于扫描仪以透镜形状或孔径形状的扫描仪变化,可以找到进一步的差异。这些差异创建了在拟合经验数据到分析模型期间的物理参数的需求。本文将讨论在模型拟合过程中重返最初似乎恒定物理参数的需要。该研究将使用设备可变性信息来证明对过程模型的准确性的影响范围。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号