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Investigation of a seesaw structure for elevating the micro-optical device by CMOS-MEMS process

机译:CMOS-MEMS过程升高微光学装置的跷跷板结构研究

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The paper proposed a novel seesaw structure for elevating the micro optical device by the driving force of micro array thermal actuator, MATA. The effects of elevating structure, lateral connection arm structure, immobile structure and width of vertical connection arm on the maximum displacements and the variation of surface flatness of the elevated micro mirror surface varied with operation voltage are investigated. The motion behavior of the elevated micro mirror is stimulated and analyzed to get the maximum displacement and inclined angle of the device. The results demonstrate a pair of {1 x 2} parallel type MATA for the elevating structure, simple beam for the lateral connection arm structure, single thermal actuator for the immobile structure and 10μm for width of vertical connection arm are the optimum design for the micro optical device. The maximum displacement and inclined angle of the proposed micro optical device are 34.7μm and 10o, respectively. The device is fabricated by Taiwan Semiconductor Manufacture Cooperation, TSMC 0.35μm 2P4M mixed signal model, based upon CIC CMOS-MEMS process. The paper will examine whether CIC CMOS-MEMS could fully support to fabricate the integrated component for MOEMS.
机译:本文提出了一种新颖的跷跷板结构,用于通过微阵列热致动器,MATA的驱动力升高微光学装置。研究了升高结构,横向连接臂结构,固定结构和垂直连接臂的宽度对最大位移的影响和升高的微镜表面的表面平坦度的变化。刺激和分析升高的微镜的运动行为以获得装置的最大位移和倾斜角度。结果展示了一对{1 x 2}并联型MATA用于升高结构,用于横向连接臂的简单梁,用于固定结构的单个热致动器,垂直连接臂的宽度为10μm是微型设计的最佳设计光学装置。所提出的微光学装置的最大位移和倾斜角度分别为34.7μm和10o。该器件由台湾半导体制造合作,基于CIC CMOS-MEMS工艺,由台湾半导体制造合作,TSMC0.35μm2p4m混合信号模型。本文将检查CIC CMOS-MEM是否可以完全支持,以制造MOEMS的集成组件。

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