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Preparation and Low Temperature Sintering of Silver Nanoparticles Based Pastes for Power Semiconductor Device Interaction

机译:用于功率半导体器件相互作用的银纳米粒子基浆料的制备和低温烧结

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The Die-bonding materials of high power semiconductor devices must have excellent heat transfer performance, preeminent thermal cycling stability, outstanding electrical conductivity and the ability to endure high operating temperature. However, the standard solders cannot meet the requirements because of its lower melting point and the environmental regulations, restricting the development of solders. Thus, it is imperative to develop outstanding capability die-bonding materials for power semiconductor device applications. In recent years, silver (Ag) have attracted ever-increasing interest and attentions due to their good stability, as well as excellent thermal and electrical properties. In this work, silver nanoparticles-based paste is demonstrated as a promising lead-free interconnect material for power semiconductor device. Silver nanoparticles with a size of 30-40 nm are synthesized with silver nitrate as precursor, hydrazine hydrate as reducing agent, and lauric acid as capping agent, which are added into terpineol and ethylene glycol to prepare paste based on a lower sintering temperature of silver nanoparticles, a high shear strength of 19.4 MPa can be achieved after sintering at 150 °C and 10 MPa for 30 min. When the sintering temperature increases to 250 °C, the shear strength even reaches 70.2 MPa. The excellent mechanical properties provide a solution for the interaction of power semiconductor device.
机译:高功率半导体器件的芯片键合材料必须具有出色的传热性能,出色的热循环稳定性,出色的导电性以及承受高工作温度的能力。然而,标准焊料由于其较低的熔点和环境法规而不能满足要求,从而限制了焊料的发展。因此,必须开发出用于功率半导体器件应用的出色性能的芯片键合材料。近年来,由于银(Ag)的良好稳定性以及出色的热和电性能,它们引起了越来越多的关注和关注。在这项工作中,基于银纳米粒子的糊剂被证明是一种有前途的无铅互连材料,用于功率半导体器件。以硝酸银为前驱体,水合肼为还原剂,月桂酸为封端剂,合成尺寸为30-40 nm的银纳米颗粒,并根据较低的银烧结温度将其加入萜品醇和乙二醇中制备浆料在150°C和10 MPa的条件下烧结30分钟后,可以获得19.4 MPa的高剪切强度。当烧结温度升至250°C时,剪切强度甚至达到70.2 MPa。优异的机械性能为功率半导体器件的相互作用提供了解决方案。

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