FPGA-Based High-Frequency Pulse Power Supply for Micro Electroplating

摘要

High-frequency pulse power supply with narrow pulse width plays a critical role for pulse plating in industry. The FPGA-based power supply introduced in this work can output multiple mode pulse waveforms including the unipolar group pulse and bipolar group pulse by means of controlling on-off of the MOSFETs. The minimum pulse width of single pulse waveforms is 4 μs. An example of Au film plating based on the power supply illustrates remarkable capabilities in many precious metals electroplating.