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Influence of substrate structure on adhesion behavior of TiN and TiAl_3/TiAlN coatings deposited by vacuum arc plasma

机译:基质结构对真空电弧等离子体沉积锡和TiAl_3 / TiAln涂层粘附性能的影响

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This paper presents the study of the influence of a substrate structure on the adhesion behavior of monolayer coatings TiN and multilayer coatings TiAl_3/TiAlN deposited by vacuum arc plasma. Martensitic steel with a coarse-grained (CG) and ultrafine-grained (UFG) structure was used for samples. The samples were subjected to ion nitriding in a glow discharge before coating deposition. Adhesion of the coatings was examined with CSM ScratchTEST. For samples with different structures, critical load was defined at which microcracks are formed in the coatings.
机译:本文介绍了基材结构对由真空电弧等离子体沉积的单层涂层锡和多层涂层TiAl_3 / TiAln的粘附性能的影响。用粗粒(CG)和超细晶粒(UFG)结构的马氏体钢用于样品。在涂覆沉积之前,将样品在辉光放电中进行离子氮化。用CSM Scraptest检查涂层的粘附性。对于具有不同结构的样品,定义了临界负荷,在涂层中形成微裂纹。

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