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Nitriding Plus DLC - The Realization of Ultrafast Duplex Processing through Hollow Cathode Technology

机译:Nitriding Plus DLC-通过空心阴极技术实现超快速双工处理

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Plasma nitriding in combination with PVD/RACVD coatings (Duplex Technology) offers many advantages compared to coatings alone. By changing the surface hardness and chemistry through nitriding, the adhesion and tribological properties of the coating can be greatly improved. Although many companies have integrated both technologies into industrial equipment in the past, it has never made it to mass production due to process cycle times and temperatures. A new type of system which uses hollow cathode technology in order to plasma nitride/carburize then coat the surface with DLC has been developed which overcomes the traditional difficulties of duplex technology. Typical nitriding cycle times are on the order of 15-30 minutes and DLC deposition rates range from 0.1-1 μm/minute. Stainless, alloy and plain carbon steels can be nitrided as well as Ti alloys. Nitriding depths can be varied as well as the properties of the DLC coatings. In addition to nitriding and DLC coating, metal and metal nitride layers (titanium and TiN) can be produced from the gas phase. Typical door to door cycle times for such processes range from 45 to 90 minutes.
机译:与单独的涂层相比,等离子体氮化与PVD / RACVD涂层(双工技术)的结合提供了许多优势。通过氮化改变表面硬度和化学性质,可以大大改善涂层的附着力和摩擦学性能。尽管过去许多公司将这两种技术都集成到了工业设备中,但由于处理周期和温度的限制,它从未实现批量生产。已经开发出一种新型系统,该系统使用空心阴极技术进行等离子体氮化/渗碳,然后用DLC涂覆表面,从而克服了双工技术的传统难题。典型的氮化循环时间为15-30分钟,DLC沉积速率为0.1-1μm/ min。不锈钢,合金和普通碳素钢以及钛合金都可以被氮化。渗氮深度以及DLC涂层的性能可以变化。除了氮化和DLC涂层外,还可以从气相中生成金属和金属氮化物层(钛和TiN)。对于此类过程,典型的门到门循环时间为45至90分钟。

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