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Laser-Induced Trench Design, Optimisation and Validation for Restricting Capillary Underfill Spread in Advanced Packaging Configurations

机译:激光诱导的沟槽设计,优化和验证,用于限制高级包装配置中的毛细管底部填充扩散

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Spreading of flip-chip capillary underfill material into regions of other components can complicate their assembly and/or integrity. We propose a novel, cost-effective means to control this spread through the use of thin, linear trenches of controlled depth on solder mask surfaces. To optimally exploit this method, an in-depth study is conducted to understand the underlying mechanism. Using high resolution 3D optical profilometry, trench profile is first correlated to key laser process parameters. Trench profiles are then evaluated by means of a custom designed underfill loading test vehicle in order to determine their relative effectiveness. Characterization of both the trench and restricted underfill profiles demonstrate correlation to the Gibbs' inequality relationship for surface tension. A trench profile is identified for chip assembly that balances high underfill restricting capacity with acceptable width and depth to suit the specificity of a substrate solder mask. The restriction of underfill spreading is then investigated in the critical dispense region of a Package on Package (PoP) application comprising stringent spacing criteria between a flip chip device and proximal BGA connections. Using trenches proposed by the laser parameter study and placed as close as 0.7 mm from chip edge, successful dispense processing and subsequent underfill flow bounding are demonstrated. Finally, underfill spread and fillet formation in the presence of trenches on the non-dispense (exit) sides of a chip assembly is investigated to determine the limits of trench proximity to chip edge. Control of underfill spread is demonstrated at trench lines as close as 0.2 mm from the chip edge on the exit sides. Using comparable samples with unrestricted underfill flow, a reduction of 0.4 mm in underfill spread on each exit side is observed. Considering the possible contact angle of the underfill at the trench edge, one can model how close the trench lines should be placed to achieve a fillet height satisfying the design specifications.
机译:将倒装芯片的毛细管底部填充材料扩散到其他组件的区域中可能会使它们的组装和/或完整性变得复杂。我们提出一种新颖的,具有成本效益的方法,通过在阻焊层表面上使用深度受控制的细线形沟槽来控制这种扩散。为了最佳地利用此方法,进行了深入的研究以了解其潜在机制。使用高分辨率3D光学轮廓测量法,首先将沟槽轮廓与关键的激光工艺参数相关联。然后通过定制设计的底部填充测试工具评估沟槽轮廓,以确定它们的相对有效性。沟槽和受限底部填充轮廓的特征都表明与表面张力的吉布斯不等式关系相关。确定了用于芯片组装的沟槽轮廓,该沟槽轮廓在高的底部填充限制能力与可接受的宽度和深度之间取得平衡,以适合基板阻焊膜的特性。然后,在包括倒装芯片器件和近端BGA连接之间严格的间距标准的“封装上封装(PoP)”应用的关键分配区域中研究底部填充扩散的限制。使用由激光参数研究提出的沟槽,该沟槽位于距芯片边缘0.7 mm的位置,证明了成功的点胶工艺和随后的底部填充流动边界。最后,研究了在芯片组件的非分配(出口)侧存在沟槽的情况下的底部填充扩散和填角形成,以确定沟槽到芯片边缘的接近度极限。在距出口侧芯片边缘近0.2 mm的沟槽线处证明了底部填充扩散的控制。使用具有不受限制的底部填充流量的可比较样品,观察到每个出口侧底部填充散布减少了0.4 mm。考虑到底部填充物在沟槽边缘的可能接触角,可以模拟沟槽线应放置多近以达到满足设计规格的圆角高度。

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