Application of Perfluorocarbon Liquids for a-C:F Film Production on Electrodes by Plasma Enhanced Chemical Vapor Deposition

摘要

Application of dielectric liquids for production of thin films on substrates was presented. In our studies, talcing a perfluorooctane C{sub}8F{sub}18 monomer liquid, an amorphous fluorocarbon thin film (a-C:F) was deposited on substrates in radio-frequency C{sub}8F{sub}18 vapor plasma. The decomposed species in the plasma were observed as C, C{sub}2, CF, CF{sub}2 and CF{sub}3. The chemical and electrical properties of a-C:F films were examined. The breakdown voltage (V{sub}s) of N{sub}2, Ar and He gases between the a-C:F film coated Al sphere-sphere electrodes for a gas pressure (p) times gap length (d), 0.1-100 Torr cm, was measured. It was found that the a-C:F film coated electrodes enhanced V{sub}s values by a several times higher than the Al electrode case.