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Mid-Infrared GeSn-Based LEDs with Sn Content up to 16

机译:锡含量高达16%的基于中红外GeSn的LED

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We have grown by Reduced Pressure Chemical Vapor Deposition (RPCVD) vertical GeSn light-emitting diodes (LEDs) with (i) Sn content ranging from 6% to 16% and (ii) with or without SiGeSn barriers. Direct band-gap behaviors and activation energies of defects affecting emission efficiency of our different stacks were analyzed by temperature dependent electroluminescence measurements. A strong light emission enhancement was observed thanks to SiGeSn confinement barriers compared to reference samples. The electroluminescence intensity of Ge0.84Sn0.16 LEDs was increased by a factor 2 compared to that of Ge0.87Sn0.13 devices. This strong enhancement at room temperature is attributed to the increase of the splitting energy between Γ and L valleys for higher Sn content LEDs.
机译:我们已经通过减压化学气相沉积(RPCVD)垂直GeSn发光二极管(LED)成长,其中(i)Sn含量为6%至16%,以及(ii)有或没有SiGeSn势垒。通过温度依赖性电致发光测量分析了影响我们不同叠层发射效率的缺陷的直接带隙行为和缺陷的活化能。与参考样品相比,由于采用了SiGeSn限制屏障,观察到了强烈的发光增强。与Ge 0.87 Sn 0.13 相比,Ge 0.84 Sn 0.16 LED的电致发光强度提高了2倍。 >设备。室温下的这种强烈增强归因于Sn含量较高的LED在Γ和L谷之间的分配能量增加。

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