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Simulation of p-type Schottky Diode Based on Al0.29Ga0.71As with Titanium/Gold Schottky Contact

机译:钛/金肖特基接触基于Al 0.29 Ga 0.71 As的p型肖特基二极管的仿真

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This paper presents a systematic simulation approach for analyzing a p-type Ti/Au/Al0.29Ga0.71 As Schottky diode with traps. The traps parameters are extracted by DLTS (Deep Level Transient Spectroscopy) technique. Simulation was carried out using Atlas-SILVACO TCAD 2D simulator. The simulation is performed using the appropriate physical models to explain the behavior of the physical mechanisms of the Schottky diode. The obtained results are the current-voltage and capacitance-voltage characteristic as function of temperature, frequency and Schottky contact diameters with and without defects.
机译:本文提出了一种用于分析p型Ti / Au / Al的系统仿真方法 0.29 0.71 如带陷阱的肖特基二极管。陷阱参数通过DLTS(深层瞬态光谱法)技术提取。使用Atlas-SILVACO TCAD 2D仿真器进行了仿真。使用适当的物理模型执行仿真,以解释肖特基二极管的物理机制的行为。获得的结果是电流-电压和电容-电压特性随温度,频率和肖特基接触直径而变化,有无缺陷。

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