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Impact of Near-Threshold and Variability on 7nm FinFET XOR Circuits

机译:阈值和可变性对7nm FinFET XOR电路的影响

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This paper evaluates ten different XOR logic gates arrangements behavior at near-threshold operation under process, voltage, and temperature (PVT) variability effects. The experiments adopt the 7nm FinFET High Performance and Low Standby Power technologies predictive models. At nominal voltages, high-performance devices show superior robustness for PVT variability, except to the influence of temperature over static current. However, near-threshold (NT) computing is a good option when lower power consumption is needed. According to results, the behavior of NT circuits under PVT variability should be highlighted, as it obtained lower values and more robustness than nominal approaches. Voltage variations inferior to 160 mV could provoke from 15% to 70% oscillation on delay. But, the same voltage variation could affect dramatically the total power deviations by 188% to 434%. Considering the different operation conditions explored in this work, the results provide valuable data and how the impact of variability is an important factor that must be explored to design more robust circuits.
机译:本文评估了在过程,电压和温度(PVT)可变性影响下,在接近阈值操作时的十种不同的XOR逻辑门布置行为。实验采用了7nm FinFET高性能和低待机功耗技术的预测模型。在标称电压下,除了温度对静态电流的影响之外,高性能器件对PVT的变化表现出出色的鲁棒性。但是,当需要较低功耗时,近阈值(NT)计算是一个不错的选择。根据结果​​,应强调NT电路在PVT可变性下的行为,因为它获得的值比标称方法更小且更鲁棒。低于160 mV的电压变化会引起15%至70%的延迟振荡。但是,相同的电压变化可能会严重影响总功率偏差188%至434%。考虑到这项工作探索的不同工作条件,结果提供了有价值的数据,以及可变性的影响是设计更鲁棒电路时必须探索的重要因素。

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