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Impact of Substrate Bias Polarity on Performance of Complementary Symmetric Lateral Bipolar on SiGe-OI Inverter

机译:衬底偏置极性对SiGe-OI逆变器互补对称横向双极性的性能的影响

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Results from recent studies in Symmetric Lateral Bipolar Transistor (SLBT) on SOI makes it as one of the most promising candidate for next generation nano electronic device in low power high speed mixed signal circuits. In this paper we carried out a systematic study and discuss the impact of substrate bias polarity on the performance of the SLBT on SiGe-OI in inverter circuit. DC analysis shows that there is slightly lower static current loss (or quiescent leakage),$mathrm{I}_{mathrm{D}mathrm{D}mathrm{Q}}$for inverter with opposite substrate bias polarity. AC analysis shows that there is improvement in delay with application of substrate bias. We observe almost no difference in$mathrm{I}_{mathrm{D}mathrm{D}mathrm{Q}}$but improvement in speed by$sim 0.156ext{ps}$with substrate bias w.r.t inverter with opposite substrate bias polarity.
机译:SOI上的对称横向双极晶体管(SLBT)的最新研究结果使它成为低功耗高速混合信号电路中下一代纳米电子器件的最有希望的候选者之一。在本文中,我们进行了系统的研究,并讨论了衬底偏置极性对逆变器电路中SiGe-OI上SLBT性能的影响。直流分析表明,静态电流损耗(或静态泄漏)略低, $ \ mathrm {I} _ {\ mathrm {D} \ mathrm {D} \ mathrm {Q}} $ 用于具有相反基板偏置极性的逆变器。 AC分析表明,施加衬底偏置可改善延迟。我们观察到几乎没有区别 $ \ mathrm {I} _ {\ mathrm {D} \ mathrm {D} \ mathrm {Q}} $ 但是速度提高了 $ sim 0.156 \ text { ps} $ 衬底偏置w.r.t逆变器具有相反的衬底偏置极性。

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