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Influence of bias potential on the tribological behavior and physical- mechanical properties of TiAlSiY-based nanostructured coatings

机译:偏压对TiAlSiY基纳米结构涂层的摩擦学行为和物理力学性能的影响

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Nanostructured multicomponent (TiAlSiY)N coatings were fabricated by the vacuum-arc cathodic evaporation (CA-PVD). The bias potential was -200 V and -500 V during the deposition process. The nanograin structure with small average crystallite size of about 7.5 nm and [110] preferred orientation were observed in the coatings deposited at high substrate bias (-500 V). Crystallites of about 41.6 nm in size and a preferred orientation with [111] axis were formed in coatings when the bias was -200 V. In this case, the nanostructured coating demonstrated the maximum hardness H= 49.5 GPa (superhardness). Additionally, the studied samples exhibited high abrasion and crack resistance, low wear at tribological tests. The testing of a polycrystalline cubic boron nitride (PCBN) cutter plate covered with (TiAlSiY)N coating fabricated at -200 V revealed an increase in the coefficient of resistance during cutting by 1.66 times in comparison with the base tool material.
机译:通过真空电弧阴极蒸发(CA-PVD)制备了纳米结构的多组分(TiAlSiY)N涂层。沉积过程中的偏压电位为-200 V和-500V。在高基材偏压(-500 V)下沉积的涂层中观察到具有约7.5 nm小平均晶粒尺寸和[110]优选取向的纳米晶粒结构。当偏压为-200 V时,在涂层中形成尺寸约为41.6 nm的微晶,并具有优选的[111]轴取向。在这种情况下,纳米结构涂层的最大硬度H = 49.5 GPa(超硬度)。此外,研究的样品在摩擦学测试中显示出高耐磨性和抗裂性,低磨损。对在-200 V下制作的覆盖有(TiAlSiY)N涂层的多晶立方氮化硼(PCBN)切割板进行的测试显示,与基础工具材料相比,切割过程中的电阻系数增加了1.66倍。

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