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Copper-based Graphene Nanoplatelet Composites as Interconnect for Power Electronics Pacakging

机译:铜基石墨烯纳米片复合材料作为电力电子封装的互连体

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摘要

The present investigation demonstrates a singlestep electrodeposition route for the fabrication of compact copper-based graphene nanoplatelets (GnPs) nanocomposite coatings, with dispersed GnP co-deposition. The effect of cathodic current density on the surface morphology of the deposits was examined. With increasing deposition current densities from 10 to 40 mA/cm2, there seemed to be a gradual increase in the lateral size of co-deposited GnPs and a decrease in their distribution density, along with a progressive decrease in the deposit surface feature. The chemical state of GnP from the sub-surface region of composite coatings was assessed using XPS in conjunction with Ar ion sputtering and found comparable to that of pristine GnPs. The Cu-GnP composite coatings exhibited slightly higher electrical sheet resistance, compared to that of the untreated Cu and pure Cu deposited counterparts.
机译:本研究表明了用于制备具有分散GnP共沉积的紧凑型铜基石墨烯纳米片(GnPs)纳米复合涂层的单步电沉积路线。检查了阴极电流密度对沉积物表面形态的影响。随着沉积电流密度从10到40 mA / cm的增加 2 ,共沉积GnP的横向尺寸似乎逐渐增加,其分布密度降低,并且沉积表面特征逐渐降低。使用XPS结合Ar离子溅射法评估了复合涂层次表面GnP的化学状态,发现其与原始GnP的化学状态相当。与未处理的铜和纯铜沉积的对应物相比,Cu-GnP复合涂层表现出略高的薄层电阻。

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