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Analysis and Measurement of Stray Light in a Visible and Near-Infrared Imaging Spectrometer

机译:可见光和近红外成像光谱仪中杂散光的分析和测量

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In this paper, the generation mechanism of stray light in a visible and near infrared imaging spectrometer with a spectral range of 400nm to 900nm is analyzed. The optical mechanical model of the instrument was established and its stray light level was simulated. Based on the notch method, a stray light measuring device was built. The veiling glare index of the imaging spectrometer was measured to be 0.84%. The uncertainty of measurement was assessed by GUM method, and the influence of uncertainty components on the measurement results was analyzed. When the confidence probability of the measuring device is 95.45%, the measurement uncertainty of veiling glare index is 0.15%. Finally, a comparison and analysis was made between the simulated values of the veiling glare index and the actual measured ones. This work provides technical support for the further development of high resolution imaging spectrometer.
机译:本文分析了可见光和近红外成像光谱仪中光谱范围为400nm至900nm的杂散光的产生机理。建立了仪器的光学力学模型,并对其杂散光水平进行了模拟。基于缺口法,构建了杂散光测量装置。成像光谱仪的面纱眩光指数经测量为0.84%。采用GUM法对测量不确定度进行了评估,并分析了不确定度分量对测量结果的影响。当测量装置的置信度为95.45%时,面纱眩光指数的测量不确定度为0.15%。最后,对遮盖眩光指数的仿真值与实际测量值进行了比较和分析。这项工作为高分辨率成像光谱仪的进一步发展提供了技术支持。

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