首页> 外国专利> VISIBLE AND NEAR-INFRARED LIGHT SHIELDING BLACK FILM, SUBSTRATE WITH VISIBLE AND NEAR-INFRARED LIGHT SHIELDING BLACK FILM, AND SOLID-STATE IMAGING DEVICE

VISIBLE AND NEAR-INFRARED LIGHT SHIELDING BLACK FILM, SUBSTRATE WITH VISIBLE AND NEAR-INFRARED LIGHT SHIELDING BLACK FILM, AND SOLID-STATE IMAGING DEVICE

机译:可见光和近红外光屏蔽黑膜,带有可见光和近红外光屏蔽黑膜的基板以及固态成像设备

摘要

PROBLEM TO BE SOLVED: To provide a visible and near-infrared light shielding black film which is superior to a conventional black film in the ability to shield visible light and a near-infrared light region and is suitable for applications requiring the ability to shield visible light and near-infrared light such as a light shielding film for solid-state imaging device, a substrate with the visible and near-infrared light shielding black film, and a solid-state imaging device.;SOLUTION: There are provided the visible and near-infrared light shielding black film, the substrate with the visible and near-infrared light shielding black film, and the solid-state imaging device. The visible and near-infrared light shielding black film contains fine metal particles having an average primary particle size of 1 nm or more and 300 nm or less, and the fine metal particles are a mixture of substantially spherical particles and substantially rod-shaped particles, a mixture of substantially spherical particles and substantially plate-shaped particles, or a mixture of substantially spherical particles, substantially rod-shaped particles, and substantially plate-shaped particles.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种可见光和近红外光屏蔽黑膜,该膜在屏蔽可见光和近红外光区域方面优于常规黑膜,适用于需要屏蔽可见光的能力的应用光和近红外光,例如用于固态成像设备的遮光膜,带有可见光和近红外遮光黑膜的基板以及固态成像设备。;解决方案:提供了可见光和近红外光近红外光屏蔽黑膜,具有可见光和近红外光屏蔽黑膜的基板以及固态成像装置。可见光和近红外光屏蔽黑色膜包含平均一次粒径为1 nm以上且300 nm以下的细金属颗粒,并且该细金属颗粒是基本上球形的颗粒和基本上棒状的颗粒的混合物,基本球形颗粒和基本板形颗粒的混合物,或基本球形颗粒,基本杆形颗粒和基本板形颗粒的混合物。;版权所有:(C)2013,JPO&INPIT

著录项

  • 公开/公告号JP2012203083A

    专利类型

  • 公开/公告日2012-10-22

    原文格式PDF

  • 申请/专利权人 SUMITOMO OSAKA CEMENT CO LTD;

    申请/专利号JP20110065806

  • 发明设计人 NOZOE TSUTOMU;NEYA SUNAO;

    申请日2011-03-24

  • 分类号G02B5/20;H01L27/14;

  • 国家 JP

  • 入库时间 2022-08-21 17:44:41

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