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A GaN HFET sensor for respiration monitoring

机译:用于呼吸监测的GaN HFET传感器

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We investigated zinc oxide (ZnO) nanostructure gated gallium nitride (GaN) heterostructure field effect transistor (HFET) devices and explored their potential application in chemical sensing and monitoring of human respiration. The ZnO nanostructures were grown on aluminum gallium nitride (AlGaN)/GaN heterostructures by a hydrothermal solution process. The atomic force microscopy (AFM) and scanning electron microscopy (SEM) analyses revealed the high density growth of the ZnO nanorods. In consequence, both the carrier mobility of AlGaN/GaN heterostructures and device current reduced due to the ZnO nanostructure growth as deduced from Hall and current-voltage (I-V) characteristics. The response time of the devices were 3 minutes when they were exposed to hydrogen at the bias of 2V and temperature 200 C in a controlled gas chamber. However, when the devices were exposed to human breath under normal atmospheric conditions, the typical response time was 2 seconds. The obtained results imply the potential use of the studied devices in low voltage compact breath sensing and non-contact monitoring of the human respiration.
机译:我们研究了氧化锌(ZnO)纳米结构的门控氮化镓(GaN)异质结构场效应晶体管(HFET)器件,并探讨了它们在化学传感和人类呼吸监测中的潜在应用。 ZnO纳米结构通过水热固溶工艺在氮化铝镓(AlGaN)/ GaN异质结构上生长。原子力显微镜(AFM)和扫描电子显微镜(SEM)分析显示了ZnO纳米棒的高密度生长。结果,由于霍尔和电流-电压(I-V)特性推导的ZnO纳米结构的生长,AlGaN / GaN异质结构的载流子迁移率和器件电流都降低了。当器件在受控气体室内以2V的偏压和200°C的温度暴露于氢气中时,器件的响应时间为3分钟。但是,当设备在正常大气条件下暴露于人的呼吸时,典型的响应时间为2秒。获得的结果暗示了所研究的设备在低压紧凑型呼吸感测和人类呼吸的非接触式监测中的潜在用途。

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