Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation

摘要

In advanced semiconductor-process technology, the ability to detect and repair lithography hotspots, which can affect printability, is essential. In this paper, we propose a two-stage cascade classifier for accurate hotspot detection. Our classifier uses a novel layout feature based on the propagation of light passing through a photomask. We performed experiments to evaluate our cascade classifier by applying it to the ICCAD-2012 CAD contest problem. The hotspot detection performance was evaluated according to two indices: (I1) the number of correctly detected hotspots over the number of actual hotspots and (I2) the number of correctly detected hotspots over the number of false hotspots. The results showed that the proposed method gained a 1.15% improvement in I1 and 24.4 times improvement in I2 on average compared to existing state-of-the-art methods, even the one with the best I1.