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Nano-devices with advanced junction engineering and improved energy efficiency

机译:具有先进的结工程技术并提高了能效的纳米器件

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In this paper, the authors have discussed the importance of junction engineering in order to achieve tunnel FET switches with improved performance and better energy efficiency via voltage scaling. Achieving heterojunctions using III-V/silicon with low density of traps seems to be one of the key challenges of these devices. Other direction is to induce electrostatically junctions between 2D electron and hole gases, with the tunneling path aligned with the electrical field and exploiting the effect of dimensionality to achieve a highly abrupt current control. 2D-2D vdW junctions with a large variety of bandgap configurations can be achieved via the use of 2D semiconductor crystals. Finally, some new classes of step slope switches can be realized by combining at least two switching mechanisms in more complex devices: negative capacitance tunnel FETs and phase-change source tunnel FET. With the last types of devices high current blocking capability and very steep slope (<;10mV/decade) can be indeed achieved. The paper show that important innovations originate in the junction engineering at nanoscale, which finally dictates the performance of the three terminal energy efficient switches.
机译:在本文中,作者讨论了结工程的重要性,以便通过电压缩放实现具有改进的性能和更好的能效的隧道FET开关。使用陷阱密度低的III-V /硅实现异质结似乎是这些器件的关键挑战之一。另一个方向是在二维电子和空穴气体之间引发静电结合,其隧穿路径与电场对准,并利用尺寸效应来实现高度突变的电流控制。通过使用2D半导体晶体,可以实现具有多种带隙配置的2D-2D vdW结。最后,可以通过在更复杂的设备中组合至少两种开关机制来实现某些新型的阶跃斜率开关:负电容隧道FET和相变源隧道FET。使用最后一种类型的设备,确实可以实现高电流阻断能力和非常陡峭的斜率(<; 10mV / decade)。本文表明,重要的创新源于纳米级的结工程,最终决定了三端节能开关的性能。

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