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Field electron emission from metal surfaces irradiated with helium plasmas

机译:从用氦等离子体辐照的金属表面发出的场电子

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Field emission properties on several different metal surfaces irradiated with helium plasmas were measured. Field emission currents from nanostructure, pinhole, and loop-like tantalum surfaces were significantly higher than that from polished tantalum (Ta) surface. Before and after the micro-breakdown, where the current density was under ~1 μA/mm2, field enhancement factor showed slight increase. On the other hand, significant increase of field enhancement factor was measured after breakdown, where the current density increased up to ~100 μA/mm2. In the scanning electron microscope observation, melted cathode spots were detected. The increment of field enhancement factor after the breakdown may be induced by thermo-field electron emission from the melted spots.
机译:测量了在用氦等离子体辐照的几种不同金属表面上的场发射特性。纳米结构,针孔和环状钽表面的场发射电流显着高于抛光钽(Ta)表面的场发射电流。在微击穿前后,电流密度低于〜1μA/ mm2,场增强因子略有增加。另一方面,击穿后测得的场增强因子显着增加,此时电流密度增加至约100μA/ mm2。在扫描电子显微镜观察中,检测到熔融的阴极斑点。击穿后场增强因子的增加可能是由熔化点的热场电子发射引起的。

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