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Investigation on electrical properties and irradiation-induced defects of neutron-transmutation-doped germanium in different neutron spectra

机译:不同中子能谱中子掺杂锗的电学性质和辐照诱发缺陷的研究

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This study aims to investigate the annealing behavior of neutron irradiation-induced defects and transmuted impurities in neutron transmutation doped germanium (NTD-Ge). Different irradiation sites at THOR with a variety of neutron spectra were selected to conduct the neutron irradiation of Ge specimens. Also the approach of Cd-shielding was adopted to cut off the influence of thermal neutrons. The results revealed that the neutron flux is an important factor in determining the amount of lattice defects as well as transmuted impurities. Neutron irradiation-induced defects act as acceptors and dominate the electrical properties in the as-irradiated and low-temperature-annealed specimens. Increasing annealing temperature enhances the defect recovery and the activation of transmuted impurities in NTD-Ge. As evidenced by the results of this study, some residual defects could still remain in NTD-Ge and take effect on its electrical conduction even though the annealing temperature is raised to 500 °C.
机译:本研究旨在研究中子trans杂锗(NTD-Ge)中中子辐照引起的缺陷和trans杂杂质的退火行为。选择THOR处具有各种中子光谱的不同辐照部位,以进行Ge样品的中子辐照。还采用了Cd屏蔽的方法来切断热中子的影响。结果表明,中子通量是确定晶格缺陷和trans杂杂质数量的重要因素。中子辐照引起的缺陷充当受主,并支配辐照和低温退火样品中的电性能。升高退火温度可提高缺陷恢复和NTD-Ge中trans杂杂质的活化。这项研究的结果证明,即使将退火温度提高到500°C,NTD-Ge仍会残留一些残余缺陷并对其导电产生影响。

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