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Preparation of chalcogenide glasses via plasma-enhanced chemical vapor deposition on the example of As-S system

机译:以As-S系统为例,通过等离子体化学气相沉积法制备硫属化物玻璃

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Bulk samples of As-S chalcogenide glasses were prepared by interaction of vapors of volatile precursors in low-temperature non-equilibrium plasma discharge (PECVD process). The PECVD synthesis was carried out in the flowing quartz reactor at the walls temperature about 250 °C. Elemental As and S were used as the initial substances. In order to compare, the As-S bulk samples were synthesized by “traditional” melting of the initial substances into evacuated quartz ampoule from the same precursors. The optical properties of the bulk samples were compared. The exhausted gas mixtures were analyzed to clarify the difference in the carbon impurities content.
机译:通过在低温非平衡等离子体放电(PECVD工艺)中挥发性前体的蒸气相互作用,制备了As-S硫族化物玻璃的大块样品。 PECVD合成在流动的石英反应器中在约250℃的壁温下进行。元素As和S用作初始物质。为了进行比较,通过将传统物质从相同的前体“传统”熔化成抽空的石英安瓿瓶来合成As-S块状样品。比较了大块样品的光学性质。分析废气混合物以澄清碳杂质含量的差异。

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