Next generation electrolytic copper plating process for HDI applications

摘要

Copper electroplating is a critical step in the fabrication of reliable High Density Interconnect (HDI) substrates intended for use as core layers in build-up applications. HDI substrates may contain vias and through holes having several different dimensions that make it challenging to meet via filling and hole throwing power (TP) requirements. A next generation Electrolytic Copper plating process was developed to fill blind micro vias and provide good TP in through holes to meet the demands of this market. Void-free bottom-up fill in via features with higher throwing power in through holes is achieved with this novel Direct Current (DC) copper electroplating product. The copper via fill plating bath is formulated with novel additives to operate over a wide range of operating conditions.