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Large-area vertical Ag columnar thin films as highly sensitive SERS substrates

机译:大面积垂直银柱状薄膜作为高度敏感的SERS衬底

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Noble metal nanostructured thin films are of great interest as competitive surface enhanced Raman scattering (SERS) substrates due to their remarkable plasmonic properties in the visible wavelength. In this work, large-area vertical Ag columnar thin films of different thickness have been prepared on the glass substrates by the simple, cost-effective glancing angle deposition technique. The Raman spectra of R6G from these substrates are measured and the experimental SERS enhancement factor is found to have the maximal value of 2.5E+8 at the optimized thickness of 680 nm. Finite difference time domain simulations have been utilized to study the near-field plasmonic properties upon these films and the simulated structure is a geometric copy obtained from the SEM image topology rather than simplified regular nanostractures. The areal electric field enhancement is sensitive to the gap size and areal column density. The wavelength and polarization dependence of localized electric enhancement in subwavelength gaps, "hot spots", are studied and the electric enhancement at different film depths is also analyzed. The simulation SERS enhancement factors are calculated and show good agreement with the experimental ones. When the thickness increases, the areal electric field enhancement decreases while the number of adsorded molecules increases, so there exists an optimized thickness to maximize the SERS performance. These results help to further our understanding of the plasmonic properties of noble metal nanostructured thin films.
机译:贵金属纳米结构薄膜作为具有竞争性的表面增强拉曼散射(SERS)衬底,受到了极大的关注,因为它们在可见光波长下具有显着的等离子体特性。在这项工作中,已经通过简单,经济高效的掠角沉积技术在玻璃基板上制备了不同厚度的大面积垂直Ag柱状薄膜。测量了来自这些底物的R6G的拉曼光谱,发现实验的SERS增强因子在最优化的680nm厚度下具有2.5E + 8的最大值。时域有限差分模拟已被用于研究这些薄膜的近场等离子体特性,并且模拟结构是从SEM图像拓扑获得的几何副本,而不是简化的规则纳米结构。区域电场增强对间隙尺寸和区域列密度敏感。研究了亚波长间隙“热点”中局部电增强的波长和偏振相关性,并分析了不同膜深度的电增强。计算了模拟的SERS增强因子,并与实验结果吻合良好。当厚度增加时,面积电场增强降低,而伴随分子的数量增加,因此存在优化的厚度以最大化SERS性能。这些结果有助于进一步了解贵金属纳米结构薄膜的等离子体特性。

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